Plasma Etch System Market Report is predicted to gain better growth in coming years 2019 to 2024. This Plasma Etch System market report provides extensive analysis of top-vendors, regional development, progressive trends, and countless growth statistics of Plasma Etch System market. Additionally, emerging opportunities and revenue forecast (2019-2024) allows easy decision-making for all readers worldwide.
About Plasma Etch System
This report studies the Plasma Etch System market. Plasma Etching System is a series of devices and equipment used together to perform plasma etching.
Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged (ions) or neutral (atoms and radicals). During the process, the plasma generates volatile etch products at room temperature from the chemical reactions between the elements of the material etched and the reactive species generated by the plasma. Eventually the atoms of the shot element embed themselves at or just below the surface of the target, thus modifying the physical properties of the target.
Covered in this report
According to this study, over the next five years the Plasma Etch System market will register a 12.9% CAGR in terms of revenue, the global market size will reach US$ 8110 million by 2024, from US$ 3910 million in 2019. In particular, this report presents the global market share (sales and revenue) of key companies in Plasma Etch System business, shared in Chapter 3.
This report presents a comprehensive overview, market shares, and growth opportunities of Plasma Etch System market by product type, application, key manufacturers and key regions and countries.
This study considers the Plasma Etch System value and volume generated from the sales of the following segments:
Segmentation by product type: breakdown data from 2014 to 2019, in Section 2.3; and forecast to 2024 in section 11.7.
- Inductively Coupled Plasma (ICP)
- Reactive Ion Etching (RIE)
- Deep Reactive Ion Etching (DRIE)
- Others
Segmentation by application: breakdown data from 2014 to 2019, in Section 2.4; and forecast to 2024 in section 11.8.
- Semiconductor Industry
- Medical Industry
- Electronics & Microelectronics
- Others
The report also presents the market competition landscape and a corresponding detailed analysis of the major vendor/manufacturers in the market. The key manufacturers covered in this report: Breakdown data in in Chapter 3.
- Oxford Instruments
- ULVAC
- Lam Research
- AMEC
- PlasmaTherm
- SAMCO Inc.
- Applied Materials, Inc.
- Sentech
- SPTS Technologies (an Orbotech Company)
- GigaLane
- CORIAL
- Trion Technology
- NAURA
- Plasma Etch, Inc.
- Tokyo Electron Limited
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Key Topics Covered:
1 Scope of the Report
2 Executive Summary
3 Global Plasma Etch System by Players
4 Plasma Etch System by Regions
5 Americas
6 APAC
7 Europe
8 Middle East & Africa
9 Market Drivers, Challenges and Trends
10 Marketing, Distributors and Customer
11 Global Plasma Etch System Market Forecast
12 Key Players Analysis
13 Research Findings and Conclusion
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